Pulsed And Pulsed Bias Sputtering Principles And Applications

Pulsed and pulsed bias focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail.

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